How Does tantalum sputtering targets Work?

23, Jun. 2025

 

Tantalum Sputtering Target Plates for Semiconductor Manufacturing

Materion produces high-purity tantalum target plates, critical for microchip architecture in the growing semiconductor industry. These plates sputter microscopic thin layers of tantalum onto silicon wafers. This enabes next-gen logic chips like DRAM and 3D-NAND with advanced nodes and superior performance.

Advanced Targets supply professional and honest service.

LEADING PROPERTIES OPTIMIZE YOUR PVD PROCESS

We have decades of expertise in high-volume production of texture-controlled tantalum for sputtering targets. The result? Disks manufactured with exceptionally consistent properties. End-users benefit from:

  • Chemistry control to parts per billion
  • High-quality deposited films (uniform thickness, resistivity)
  • Customized deposition rates for optimal sputtering performance

Materion's reliable, consistent, and proven methods have allowed us to remain a leading US-based manufacturer. We supply tens of thousands of advanced texture-controlled plates to the semiconductor industry for consistent and rate-controlled deposition.

TANTALUM MATERIALS

We are a global leader in tantalum materials. We offer >99.995% purity with chemical and metallurgical uniformity for optimal performance in logic, memory, RF & power devices, and hard disk drives. Our tantalum is available in a variety of forms, including advanced texture-controlled plates, sputtering targets, coils, and pots.

For more tantalum sputtering targetsinformation, please contact us. We will provide professional answers.

Tantalum Ta Sputtering Targets - Kurt J. Lesker Company

Tantalum (Ta) Sputtering Targets Overview

Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here.

Tantalum (Ta) General Information

Tantalum is classified as a transition metal on the Periodic Table and is considered to be one of the refractory metals which are highly resistant to corrosion. Tantalum has a melting point of 3,017°C, a density of 16.6 g/cc, and a vapor pressure of 10-4 Torr at 2,590°C. It is metallic grey-blue in color with strikingly similar chemical properties to niobium. It is mainly used to make surgical implants due to its non-toxic nature. It is also used as a capacitor for electronics and may be alloyed with other metals to add strength and durability. Tantalum, along with its alloys and compounds, is evaporated under vacuum to make semiconductors, optical coatings, magnetic storage media, and wear and corrosion resistant coatings.

Tantalum (Ta) Specifications

* This is a recommendation based on our experience running these materials in KJLC guns. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.

The company is the world’s best ito sputtering targets supplier. We are your one-stop shop for all needs. Our staff are highly-specialized and will help you find the product you need.