Tantalum sputtering targets are high-purity materials used in coating processes. They stand out due to their uniform grain structure, exceptional density, and remarkable corrosion resistance.
With competitive price and timely delivery, Advanced Targets sincerely hope to be your supplier and partner.
Our tantalum sputtering targets are precision-engineered for peak performance, ideal for advanced coating applications in research and industrial settings. We focus on delivering targets of the utmost quality, tailored to meet the specific demands of your projects.
At AEM Metal, we ensure our tantalum sputtering targets are the best on the market. Using the latest technology, we make targets that exceed industry standards. Our thorough testing means you get reliable and high-performance products every time.
Surface Check: Each target is visually inspected for any surface imperfections such as scratches, pits, or irregularities. Dimensional Accuracy: The thickness, width, and length of the foil are measured to ensure they meet specified tolerances.
Purity Testing: To confirm the chemical composition and purity of the tantalum, tests like X-ray fluorescence (XRF) and inductively coupled plasma (ICP) are conducted. Trace Elements Analysis: Identifying trace elements is crucial to ensure the foil's suitability for sensitive applications, especially in electronics and medical fields.
Tensile Strength Test: Determines the target's strength by measuring its resistance to breaking under tension. Elongation Measurement: Assesses the ductility of the target, or how much it can stretch before breaking.
Ultrasonic Testing: Ultrasonic waves are used to detect internal flaws or inhomogeneities. Radiographic Testing: X-rays or gamma rays are used to inspect the internal structure of the tubes, identifying any internal defects.
Contact us to discuss your requirements of graphite target. Our experienced sales team can help you identify the options that best suit your needs.
The target is exposed to various corrosive agents to ensure its resistance, a key property for its use in chemical processing and medical devices.
Using micrometers or other precise instruments, the exact thickness of the target is verified, as it is a critical factor in many applications.
After passing all tests, the tantalum sputtering target is certified. A report is provided to the buyer detailing the tests conducted and their results, ensuring traceability and quality assurance.
Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here.
Tantalum is classified as a transition metal on the Periodic Table and is considered to be one of the refractory metals which are highly resistant to corrosion. Tantalum has a melting point of 3,017°C, a density of 16.6 g/cc, and a vapor pressure of 10-4 Torr at 2,590°C. It is metallic grey-blue in color with strikingly similar chemical properties to niobium. It is mainly used to make surgical implants due to its non-toxic nature. It is also used as a capacitor for electronics and may be alloyed with other metals to add strength and durability. Tantalum, along with its alloys and compounds, is evaporated under vacuum to make semiconductors, optical coatings, magnetic storage media, and wear and corrosion resistant coatings.
* This is a recommendation based on our experience running these materials in KJLC guns. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.