Hot pressing sintering process: raw material → mixing → molding → isostatic pressing → dip roasting → graphitization → purification → inspection → machining → Shipping
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We can provide a variety of rectangular and circular high purity graphite targets manufactured by isostatic pressing sintering process, advanced manufacturing technology and stable raw material supply, to ensure that the product has a fine and uniform microstructure, low porosity, high density, excellent electrical and thermal properties, to meet the requirements of arc and sputtering performance, with good stability.
Graphite (C) sputtering targets are widely used in physical vapor deposition (PVD) processes for depositing thin films of carbon onto a substrate. Graphite is a form of carbon that is highly conductive, chemically stable, and has a high melting point, making it ideal for a range of applications, such as in the manufacture of electronic devices, solar cells, and biomedical implants.
The sputtering process involves bombarding the target material with high-energy plasma ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Graphite sputtering targets are made of high-purity graphite materials and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.
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Graphite sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have excellent thermal and electrical conductivity, good adhesion to substrates, and high hardness, which make them suitable for use in high-temperature and high-pressure environments.
Graphite sputtering targets are commonly used in the production of electronic devices, such as integrated circuits, solar cells, and flat panel displays. They are also used in the manufacture of biomedical implants and other medical devices due to their biocompatibility and chemical stability.
In addition, graphite sputtering targets are used in the production of coatings for cutting tools, which need to withstand high temperatures and pressures. They are also used in the aerospace industry for thermal protection and as a lubricating material in high-temperature environments.
Overall, graphite sputtering targets are highly valued in the semiconductor industry and other high-tech fields due to their unique properties and a wide range of applications.